magnetron sputtering

常見(jiàn)例句

雙語(yǔ)例句

• Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
  沉積速率是磁控濺射鍍膜技術(shù)中的一項(xiàng)重要指標(biāo)，它由許多因素決定。
• The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
  從理論上分析了平麪磁控濺射靶沉積薄膜的厚度均勻性。
• The development, principle and applications of magnetron sputtering technique are introduced in this paper.
  該文介紹了磁控濺射沉積技術(shù)的基本原理、發(fā)展及應(yīng)用。
返回 magnetron sputtering