magnetron sputtering

基本解釋

• [電子] 磁控濺射；[電子] 磁控琯濺射

英漢例句

雙語例句

• Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
  沉積速率是磁控濺射鍍膜技術(shù)中的一項(xiàng)重要指標(biāo)，它由許多因素決定。
• The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
  從理論上分析了平麪磁控濺射靶沉積薄膜的厚度均勻性。
• The development, principle and applications of magnetron sputtering technique are introduced in this paper.
  該文介紹了磁控濺射沉積技術(shù)的基本原理、發(fā)展及應(yīng)用。

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詞組短語

短語

• magnetron plasma sputtering 多靶磁控濺射
• magnetron rf sputtering system 磁控射頻濺射
• magnetron co sputtering 磁控共濺射
• dc magnetron reaction sputtering 直流磁控反應(yīng)濺射
• DC magnetron reactive sputtering 直流磁控反應(yīng)濺射

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專業(yè)釋義

機(jī)械工程

• 磁控濺射

  Titanium nitride thin film is deposited on Si(111) substrate by DC reactive magnetron sputtering.
  採用直流反應(yīng)磁控濺射方法在Si(111)基底上沉積了氮化鈦薄膜。

  電子、通信與自動控制技術(shù)

• 磁控濺射

  The results of this work are summarized as follow:1. We deposited ZnO films on different kinds of substrates by the method of RF magnetron sputtering.
  主要研究工作和結(jié)論如下:1、採用射頻反應(yīng)磁控濺射的方法,在不同襯底上制備了ZnO薄膜。

• 磁控琯濺射
• 磁控濺鍍