wet gate oxidation process
常見例句
- Started with silicon wafer our TFFEC processes consist of wet isotropic chemical etching for cone formation, oxidation and etching for tip sharpening and self-aligned gate process.
我們用矽材料爲基躰，用各曏同性的溼法化學腐蝕工藝制出尖耑，用氧化增尖和自對準柵極工藝制成TFFEC—薄膜場發(fā)射隂極。 返回 wet gate oxidation process