sputter deposition

基本解釋

The method comprises cleaning treatment of the graphite substrate and a technical process of magnetron sputtering deposition.
所述的石墨襯底的清潔処理，是將石墨襯底生長(zhǎng)麪機(jī)械拋光；
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And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films.
同時(shí)，各種PVD方法也被用來制備硼碳氮薄膜，如濺射法、離子束輔助沉積和脈沖激光沉積等。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本設(shè)計(jì)主要對(duì)磁控濺射鍍膜機(jī)真空室進(jìn)行改進(jìn)設(shè)計(jì)，以改善磁控濺射鍍膜的工藝條件。設(shè)計(jì)內(nèi)容包括真空室及相關(guān)機(jī)搆設(shè)計(jì)、計(jì)算。