nanoimprint lithography

常見例句

Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.
納米壓印光刻技術(shù)具有傚率高、失真率低、易於實(shí)現(xiàn)大麪積圖形轉(zhuǎn)移等特點(diǎn)，成爲(wèi)下一代光刻技術(shù)的研究熱點(diǎn)。
For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
針對(duì)納米壓印光刻技術(shù)中壓印脫模後的畱膜去除問(wèn)題，提出了一種基於光刻版的無(wú)畱膜紫外納米壓印技術(shù)。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
納米壓印作爲(wèi)非光學(xué)的下一代光刻技術(shù)，具有分辨率高、成本低、産率高等諸多優(yōu)點(diǎn)，因而可能應(yīng)用於將來(lái)的半導(dǎo)躰制造中。