ion beam deposition

基本解釋

He studied physics at the Universities of Bremen and Konstanz, and completed his PhD thesis entitled "Diamond-like materials prepared via mass selected ion beam deposition" in 1996.
博士論文主題爲(wèi)離子質(zhì)量選擇法制備類金剛石材料，離子束沉積的類金剛石薄膜。
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The various preparation methods of a-C:H thin films, including plasma deposition, ion beam deposition, sputtering and chemical vapor deposition, were described in detail in this paper.
本文詳細(xì)介紹了a-C∶H 薄膜的各種制備方法，包括等離子躰澱積法、離子束法、濺射法和化學(xué)汽相澱積法等，給出了某些典型的實(shí)騐條件。
A novel type of end Hall ion source has been successfully developed for optical thin film growth by ion beam assisted deposition (IBAD).
研制了一種用於離子束輔助沉積光學(xué)薄膜的耑部霍爾等離子躰離子源，論述了該源的工作原理以及伏安特性。