immersion lithography

基本解釋

By comparing to the summarized competing next-generation lithography (NGL) technologies, the advantages of immersion lithography were presented.
概括了具有競爭力的下一代光刻技術(shù)，竝對比了浸沒式光刻的優(yōu)勢；
It will also use copper interconnects, low-k, strain silicon and other features. Like 32-nm, Intel will make use of 193-nm immersion lithography.
這款産品將使用Intel第三代HKMG工藝，第五代矽應(yīng)變技術(shù)，另外與32nm類似，22nm制程仍將繼續(xù)使用193nm液浸式光刻技術(shù)。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本發(fā)明公開一種設(shè)備和方法，用於在更換平板印刷機（10）中工件（208）期間，將浸沒流躰（212）保持在鄰接投射透鏡（16）的間隙中。
ip.com

Immersion lithography has been used in production since 2004, but Intel will be pushing this technology to the extreme.
FORBES: Stimulating Technology
Inside those arenas the key to building the next generation of tiny chips is a technique known as immersion lithography.
FORBES: Magazine Article
Rival chipmakers switched to immersion lithography before Intel did.
FORBES: Magazine Article