sheet resistance

基本解釋

Of all these factors, the implantation dose has the most significant influence on mobility and sheet resistance.
在這些關(guān)系中，注入劑量對(duì)遷移率及薄層電阻有最主要的影響。
The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.
對(duì)薄層電阻、接觸、光掩模對(duì)準(zhǔn)、線條寬度、器件參數(shù)與摻雜的相關(guān)性等內(nèi)容進(jìn)行了初步試驗(yàn)和分析。
In this article, we drive the equations of measuring resistivity and surface sheet resistance, taking into account the contact dimension and putting the location of the four probes arbitrary.
本文考慮到接觸面積大小的影響，并讓四根探針排列成任意形狀，導(dǎo)出了測(cè)量電阻率和薄層電阻的關(guān)系式。

方塊電阻
方電阻
The minimum of sheet resistance is about 110 Ω,the minimum specific resistance of can reach 1.65 X 10-2 Ω·cm.
經(jīng)5次鍍膜后的ITO薄膜方電阻可達(dá)110Ω／，電阻率為1.65×10-2Ω·cm。
方阻
Sheet resistance, transmittance and refractive index were as function of IR irradiation temperature （TIR）.
濺射時(shí)紅外輻射溫度TIR對(duì)薄膜方阻、薄膜透射率和折射率有重要影響。
薄層電阻
片電阻
薄片電阻

薄層電阻
In this paper,the circuit used for testing sheet resistance is designed using single chip processor.
本文還利用單片機(jī)系統(tǒng)設(shè)計(jì)了薄層電阻測(cè)試電路，對(duì)于程序中用到的范德堡隱函數(shù)，利用非線性反演和規(guī)范化擬合的方法推導(dǎo)出其多項(xiàng)式顯函數(shù)形式。
表單電阻