scanning electron beam lithography
基本解釋
- [計(jì)算機(jī)科學(xué)技術(shù)]掃描式電子束刻蝕
- [電子、通信與自動(dòng)控制技術(shù)]掃描式電子束刻蝕
英漢例句
- The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
電子束曝光機(jī)的偏轉(zhuǎn)系統(tǒng)控制電子束偏轉(zhuǎn)掃描。 - These techniques include molecular assembly, arrangement of nano particles, scanning force microscopy fabrication and nano lithography based on photon beam, electron beam, and ion beam.
結(jié)果對(duì)基于分子組裝與納米光刻的納料制造技術(shù)給予很大的重視。
雙語(yǔ)例句
詞組短語(yǔ)
- scanning -electron-beam lithography system 掃描電子束曝光機(jī)
短語(yǔ)
專(zhuān)業(yè)釋義
- 掃描式電子束刻蝕
- 掃描式電子束刻蝕