photoelectron spectra

基本解釋

A new type technique of semiconductor cleaning is studied via infrared absorption spectra, X ray photoelectron spectra and surface tension detector.
報(bào)道了利用紅外吸收譜、X射線光電子譜和表面張力測(cè)試儀對(duì)新型半導(dǎo)體清洗工藝進(jìn)行研究的結(jié)果。
The results of cleaning using the new type of cleaning technique and RCA standard cleaning technique are compared. The results are obtained by X ray photoelectron spectra?
利用紅外吸收譜、X射線光電子譜和原子力顯微鏡等，把它和標(biāo)準(zhǔn)RCA清洗工藝的清洗效果做了比較。
Then, X-ray photoelectron spectra (XPS) and H2-temperature programmed reduction (H2-TPR) were conducted to evaluate the variation of redox properties during the substitution process.
然后，X射線光電子能譜（XPS）和H2 -程序還原（H2 - TPR）等溫度進(jìn)行了評(píng)估，在替代過(guò)程中的氧化還原性的變化。