negative ion source

基本解釋

It was used to predict the beam optical performance of an extraction system for a surface-plasma bucket negative ion source.
對表面-等離子體型桶式負(fù)離子源引出系統(tǒng)束光學(xué)的性質(zhì)進(jìn)行了數(shù)值模擬。
The negative ion element will become the gas source center and form an ejection in the process of evaporation of coating material, so decrease the damage threshold of the coatings.
并且提出負(fù)離子元素在膜料蒸發(fā)過程中形成氣源中心，產(chǎn)生噴濺，從而使薄膜的損傷閾值降低。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等離子體源離子注入裝置由脈沖負(fù)高壓源系統(tǒng)、熱陰極弧放電系統(tǒng)、真空室及樣品臺、真空系統(tǒng)和監(jiān)測系統(tǒng)等五部分組成。