nanoimprint lithography

基本解釋

• 納米壓印
• 奈米印刷技術(shù)

英漢例句

雙語例句

• Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.
  納米壓印光刻技術(shù)具有效率高、失真率低、易于實(shí)現(xiàn)大面積圖形轉(zhuǎn)移等特點(diǎn)，成為下一代光刻技術(shù)的研究熱點(diǎn)。
• For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
  針對(duì)納米壓印光刻技術(shù)中壓印脫模后的留膜去除問題，提出了一種基于光刻版的無留膜紫外納米壓印技術(shù)。
• Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
  納米壓印作為非光學(xué)的下一代光刻技術(shù)，具有分辨率高、成本低、產(chǎn)率高等諸多優(yōu)點(diǎn)，因而可能應(yīng)用于將來的半導(dǎo)體制造中。

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詞組短語

短語

• Mold for nanoimprint lithography 高分辨率納米壓印模板
• negative nanoimprint lithography 負(fù)型納米壓印技術(shù)
• Reversal Nanoimprint Lithography 逆納米壓印技術(shù)
• Roller Nanoimprint Lithography 滾動(dòng)式壓印
• UV -based Nanoimprint Lithography 米壓印微影

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專業(yè)釋義

電子、通信與自動(dòng)控制技術(shù)

• 納米壓印

  Three manufacture methods of these digitalconcatenated gratings have been proposed,which are holography method,electron beamlithography,and nanoimprint lithography.
  還提出了三種可實(shí)施的制作方法：全息曝光、電子束曝光、和納米壓印。

  材料科學(xué)

• 奈米印刷技術(shù)