ion beam sputtering
常見例句
- WO_3 thin films prepared by Reactive Ion Beam Sputtering are amorphous at RT substrate temperature.
本文利用反應(yīng)離子束濺射技術(shù)制備WO_3薄膜,在襯底溫度為室溫時,濺射制備的薄膜經(jīng)電子束(?) - Ion beam sputtering deposited Ni was used as etching mask. The measured etching rates increased with the increasing ICP dc bias.
采用離子束濺射生長的N i作為刻蝕掩模,刻蝕速率隨ICP直流偏壓的增加而增加。 - The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
濺射特性研究結(jié)果表明:屏極電壓和濺射氣壓對離子束均勻性和束流密度影響顯著; 返回 ion beam sputtering