cathode sputtering

基本解釋

A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
設(shè)計(jì)了一種網(wǎng)狀陰極濺射靶，它是由多個(gè)空心陰極并列交叉組合而成。
It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate.
它具有工作氣壓高，維持電壓低，陰極濺射率高等特點(diǎn)。
The surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.
本文研究了輝光放電離子轟擊釬焊時(shí)陰極濺射現(xiàn)象對(duì)工件表面的凈化作用。