bias sputtering
常見(jiàn)例句
- The trapped amount of helium depends on the relative helium content in sputtering gas, applied bias and substrate temperature.
實(shí)驗(yàn)研究了薄膜中的 氦 含量與濺射真空室氣氛中 氦的相對(duì) 含量、基底偏壓及沉積溫度間的關(guān)系。 - Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四極質(zhì)譜儀測(cè)量了試驗(yàn)參數(shù)對(duì)高壓脈沖增強(qiáng)射頻磁控濺射PTFE靶等離子體氣氛的影響規(guī)律。 - This article mainly deals with the relationship between the negative bias of the substrate and the magnetron-sputtering ion plating aluminum film on the co- pper.
本文主要論述基板員偏壓與銅基體磁控濺射離子鍍鋁膜的關(guān)系。 返回 bias sputtering